Dielectric and electrical properties of annealed ZnS thin films. The appearance of the OLPT conduction mechanism in chalcogenides

dc.contributor.affiliationUniversidade de Santiago de Compostela. Departamento de Química Físicagl
dc.contributor.authorKoaib, J.
dc.contributor.authorBouguila, N.
dc.contributor.authorAbassi, H.
dc.contributor.authorMoutia, N.
dc.contributor.authorKraini, M.
dc.contributor.authorTimoumi, A.
dc.contributor.authorVázquez Vázquez, Carlos
dc.contributor.authorKhirouni, K.
dc.contributor.authorAlaya, S.
dc.date.accessioned2020-05-12T18:20:06Z
dc.date.available2020-05-12T18:20:06Z
dc.date.issued2020
dc.description.abstractThe annealing temperature (Ta) dependence of the structural, morphological, electrical and dielectric properties of ZnS thin films was investigated. In this work, we consider the as-deposited and annealed ZnS thin films at different temperatures. The as-deposited films were amorphous in nature. However, the films annealed at Ta ≥ 673 K, exhibited a hexagonal structure with (002) preferential orientation. The post annealing caused an improvement in crystallinity. The best one was observed at Ta = 723 K. Grain size increased from 7 nm to 25 nm as annealing temperature was increased from 673 K to 723 K. The surface of annealed samples is homogenous and uniform and the rms roughness is dependent on the annealing temperature: it increases with temperature within the range 5–50 nm. The film electrical conductance is found to be dependent on frequency measurement and annealing temperature: the dc conductance exhibits semi-conductor behavior for all ZnS films over the explored range of temperature and the conductance was found to enhance with increasing annealing temperature up to 623 K. In addition, it was observed that the highest conductance and lowest activation energy of ZnS films were obtained at an annealing temperature of 623 K. The mechanism of alternating current ac conductance can be reasonably explained in terms of the overlapping-large polaron tunnelling (OLPT) model for samples annealed at 623 K and 673 K. To our knowledge, this conduction mechanism was rarely found in chalcogenide materials. A significant change of Nyquist plot with annealing temperature was noted permitting the correlation between the microstructure and its electrical properties. The impedance analysis investigated that the relaxation process is well pronounced for the both annealed films at 623 K and 673 K. The dielectric behavior was associated to the polarization effect, an improvement on the dielectric constant ε′ and dielectric loss ε′′ with annealing was noticed.gl
dc.description.peerreviewedSIgl
dc.description.sponsorshipThis work was supported by Tunisian Ministry of Higher Education and Scientific Research, Spanish Ministry of Science and Innovation – FEDER Funds (MODENA Project CTQ2016- 79461-R) and Fundaci´on Ram´on Areces (Spain, ProjectCIVP18A3940). NANOMAG group belongs to Galician Competitive Research Group ED431C-2017/22, programme co-funded by FEDER, and AEMAT Strategic Partnership (ED431E-2018/ 08, Xunta de Galicia, Spain).gl
dc.identifier.citationKoaib, J., Bouguila, N., Abassi, H., Moutia, N., Kraini, M., & Timoumi, A. et al. (2020). Dielectric and electrical properties of annealed ZnS thin films. The appearance of the OLPT conduction mechanism in chalcogenides. RSC Advances, 10(16), 9549-9562. https://doi.org/10.1039/c9ra10284agl
dc.identifier.doi10.1039/C9RA10284A
dc.identifier.essn2046-2069
dc.identifier.urihttp://hdl.handle.net/10347/22251
dc.language.isoenggl
dc.publisherRoyal Society of Chemistrygl
dc.relation.publisherversionhttps://doi.org/10.1039/C9RA10284Agl
dc.rights© The Royal Society of Chemistry 2020. Open Access Article. This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licencegl
dc.rights.accessRightsopen accessgl
dc.rights.urihttps://creativecommons.org/licenses/by-nc/3.0/
dc.titleDielectric and electrical properties of annealed ZnS thin films. The appearance of the OLPT conduction mechanism in chalcogenidesgl
dc.typejournal articlegl
dc.type.hasVersionVoRgl
dspace.entity.typePublication
relation.isAuthorOfPublicationf1808a6d-7e27-4ede-a489-1d85519c8b9b
relation.isAuthorOfPublication.latestForDiscoveryf1808a6d-7e27-4ede-a489-1d85519c8b9b

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